Schwarze Siliziumkarbid-Sandstrahlmittel
Schwarzes Siliciumcarbid wird in elektrischen Innenwiderstandsöfen aus hochreinem Quarzsand und Petrolkoks hergestellt; seine Kombination aus sehr hart und scharf macht es zu einem sehr aggressiven Schleifmittel.
PHYSIKALISCHE EIGENSCHAFTEN
| Spezifisches Gewicht | 3,95 Gramm/ cm³ |
| Mohs-Härte | 9.15 |
| Maximale Betriebstemperatur | 1900℃ |
| Schmelzpunkt | 2250℃ |
Verwendungsmöglichkeiten: Schleifen, Strahlen, Polieren, Keramik, Rostentfernung, Oberflächenbehandlung, Bodenbeschichtung, abriebfeste Schichten usw.
TYPISCHE CHEMISCHE ANALYSE [%]
| SiC | Fe2O3 | FC | F.Si | SiO 2 | GESETZ |
| ≥98,5 | ≤0,10 | ≤0,20 | ≤0,20 | ≤0,50 | < 0,05 |
PARTIKELGRÖSSENVERTEILUNG
| F8 | +4000 µm | 0 | +2800µm | ≤20% | +2360 µm | ≥45% | +2360+2000um | ≥70% | -1700µm | ≤3% |
| F10 | +3350 µm | 0 | +2360 µm | ≤20% | +2000 µm | ≥45% | +2000+1700µm | ≥70% | -1400um | ≤3% |
| F12 | +2800µm | 0 | +2000 µm | ≤20% | +1700µm | ≥45% | +1700+1400um | ≥70% | -1180µm | ≤3% |
| F14 | +2360 µm | 0 | +1700µm | ≤20% | +1400um | ≥45% | +1400+1180µm | ≥70% | -1000µm | ≤3% |
| F16 | +2000 µm | 0 | +1400um | ≤20% | +1180µm | ≥45% | +1180+1000µm | ≥70% | -850 µm | ≤3% |
| F20 | +1700µm | 0 | +1180µm | ≤20% | +1000 µm | ≥45% | +1000+850µm | ≥70% | -710µm | ≤3% |
| F22 | +1400um | 0 | +1000 µm | ≤20% | +850 µm | ≥45% | +850+710µm | ≥70% | -600 µm | ≤3% |
| F24 | +1180µm | 0 | +850 µm | ≤25% | +710µm | ≥45% | +710+600µm | ≥65% | -500µm | ≤3% |
| F30 | +1000 µm | 0 | +710µm | ≤25% | +600 µm | ≥45% | +600+500µm | ≥65% | -425µm | ≤3% |
| F36 | +850 µm | 0 | +600 µm | ≤25% | +500 µm | ≥45% | +500+425µm | ≥65% | -355µm | ≤3% |
| F46 | +600 µm | 0 | +425µm | ≤30% | +355 µm | ≥40% | 355+300µm | ≥65% | -250 µm | ≤3% |
| F54 | +500 µm | 0 | +355 µm | ≤30% | +300 µm | ≥40% | +300+250µm | ≥65% | -212µm | ≤3% |
| F60 | +425µm | 0 | +300 µm | ≤30% | +250 µm | ≥40% | 250+212µm | ≥65% | -180 µm | ≤3% |
| F70 | +355 µm | 0 | +250 µm | ≤25% | +212 µm | ≥40% | +212+180µm | ≥65% | -150 µm | ≤3% |
| F80 | +300 µm | 0 | +212 µm | ≤25% | +180 µm | ≥40% | +180+150µm | ≥65% | -125µm | ≤3% |
| F90 | +250 µm | 0 | +180 µm | ≤20% | +150 µm | ≥40% | +150+125µm | ≥65% | -106µm | ≤3% |
| F100 | +212 µm | 0 | +150 µm | ≤20% | +125µm | ≥40% | +125+106µm | ≥65% | -75µm | ≤3% |
| F120 | +180 µm | 0 | +125µm | ≤20% | ≥40% | ≥40% | +106+90µm | ≥65% | -63µm | ≤3% |
| F150 | +150 µm | 0 | +106µm | ≤15% | +75 µm | ≥40% | +75+63um | ≥65% | -45µm | ≤3% |
| F180 | +125µm | 0 | +90µm | ≤15% | +75 µm | * | +75+63um | ≥40% | -53µm | * |
| F220 | +106µm | 0 | +75 µm | ≤15% | +63 µm | * | +63+53um | ≥40% | -45µm | * |
